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Theory and Fabrication of Integrated Circuits
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Students performing oxidation

Devices Fabricated in the ece444 Lab

U of I Logo Control Structures Contact chains, TLM resistors, Kelvin structures Process control structures Bipolar Junction Transistors pMOS FETs nMOS FETs Load Inverter Miscellaneous FETs Capacitors pn Junction Diodes Resistance Structures Logic Circuits Load Inverter Electrical Misalignment structures ECE444 navigable mask

Devices

BJTs

Capacitors

Contact Resistance

Control Structures

Diodes

Inverters

Integrated Circuit Cells

Misalignment Structures

Miscellaneous FETs

nMOSFETs

pMOSFETs

Resistors


Device Cell


LASI was used for mask layout.

The mask set is currently under revision 1998: Dane Sievers, which is a minor redesign of revision 1994: Ron Stack. All revisions are based on the work of revision 1991: Kevin Tsurutome.


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Department of Electrical and Computer Engineering
College of Engineering
University of Illinois Urbana-Champaign

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